A quantity which quantifies the number of particles transitioning through a defined area.

Dose has different relevance in different applications. In TEM and SEM discussions of dose primarily revolve around beam induced damage and preventing sample destruction. In beam lithography and focused-ion beam milling a specific dose is intended to intentionally modify a sample.

We note that for a given experiment dose may be determined by the beam current density distribution, dwell time, and illuminated area. Connected to that, care should be taken with quantification and units of dose. Dose may be described as charge per unit area or charge per unit pixel. In specific EM application, typically beam lithography and focused-ion beam milling, instrument software may offer the possibility of calculating dose as charge per unit length or particle quantity. Despite this, the physical meaning of dose will always depend on an area.

With the given term we intend to establish an umbrella class from which different, more specific sub-classes can be defined depending on application.